On numerous occasions AJA has supplied Radial Turret Sputtering Sources. This design locates multiple source heads, oriented radially, on the end of a rotatable support tube running through a hollow shaft, UHV, ferroflluid rotary vacuum feedthrough. The source heads are cooled and powered through the hollow support tube and the assembly is indexed with locking positioning to aim the desired source at the substrate. A single port can now be used to introduce multiple magnetrons into a deposition chamber. A very interesting configuration has two Radial Turrets mounted from opposite sides of a chamber and angled onto a rotating substrate with proper shielding. With (2) four head turrets, this geometry allows for 16 different material co-deposition combinations. AJA manufactures Radial Turret Sources with up to 12 heads.

AJA also offers Axial Turret Sputtering Sources. This design locates multiple source heads, oriented axially, on the end of a rotatable support tube running through a hollow shaft, UHV, ferroflluid rotary vacuum feedthrough. The source heads are cooled and powered through the hollow support tube and the assembly is indexed with locking positioning to aim the desired source at the substrate. A single port can now be used to introduce multiple magnetrons into a deposition chamber. Another interesting configuration has each source head fitted with tilt gimbals allowing further geometrical adjustment of the sputter direction. AJA manufactures Axial Turret Sources with up to 12 heads.

Periodically customers want to coat the inside of cylindrical tubes. This can be difficult since most magnetron sputter sources are either too large or not designed to operate within the tubular substrate itself. AJA has developed very low profile, rectangular magnetrons utilizing 5" and 8" long targets which have their cooling and power delivered from the end of the source via long support tubes. By inserting the source heads into the end of a rotating, tubular substrate and moving either the source or the substrate in a linear direction, a uniform film can be applied in tubes as small as 4" diameter. AJA has also supplied numerous larger, end mounted rectangular sources for other special applications.

In 1994 AJA was awarded a joint patent with the U.S. Air Force for the CTM (Conical Target Magnetron) designed to provide efficient off axis deposition of HiTC superconductors. Since this time variations on the target geometry, cooling efficiency and source size have been explored and delivered. Most current applications are based around minimizing damage due to high energy ions or neutrals. One particularly interesting application is the deposition of conductive oxides such as ITO for displays. These sources all feature integral process gas distribution and are available in both HV and UHV versions.