ATC-B BATCH COATING SYSTEMS
|
|
|
|
|
| |
|
|
The AJA International, Inc. ATC-B Series Batch Coaters are custom engineered sputtering systems built to handle small production runs of multiple substrates. The final system configuration will depend on the actual requirement. For sputter up / down geometries, vertical cylinder chambers are commonly used. Horizontal cylinders or rectangular, in-line systems are employed for horizontal (side) sputtering applications. Side sputtering is generally preferred for extended process times since material build-up has no chance to fall onto the substrate or into the magnetron source thereby aborting the process in mid stream.
In order to optimize these system to a given process, AJA engineers can draw on a long history of standard and custom sputter source and substrate holder designs to satisfy the specific needs of the application. For example, one ATC-B horizontal cylinder has special magnetron sputter sources designed to reliably run processes which last 4 days each.
|
|
|
|
|
|
| |
TYPICAL SPUTTERING SYSTEM CONFIGURATIONS
|
|
|
|
|
|
| |
|
|
With over 100 different types of magnetron sputter sources designed and delivered since 1991, AJA International, Inc. has the capability to precisely match the sputter source to the requirement with proven technology. The STXL Series (linear, 2", 3", 4", 5" or 6" wide and up to 40" long), the STX Series (6" to 12" diameter), the Nautilus Series Rotating Magnetrons (8", 10" and 12" diameter), the TR Series Triangular Magnetrons and the CTM Series Hollow Cathode Cylindrical Magnetrons (2" to 12" ID) are all AJA designs with proven track records which can be employed to get the job done as efficiently and as reliably as possible.
Most AJA International, Inc. production magnetron sputter sources feature the unique modular magnet array allowing them to be configured for balanced, unbalanced, magnetic material and facing target sputtering.
|
|
|
AJA's STXL Series Magnetrons feature direct-cooled copper backing plates for maximum deposition rate and easily accessible magnet arrays allowing the end user to choose between optimum uniformity or optimum target utilization of up to 60-70%. The sources feature integral gas injection and high power RF or DC operation. Rectangular versions in 3” , 4” or 6” widths are offered up to 40” long. Both internal mount (via flex hose or solid tube) and external flange mount designs are available. |
|
|
| |
 |
The AJA CT1210 cylindrical target magnetron is used for 3D sputtering where substrates are inserted into the target / cathode. |
|
|
 |
The AJA TR5313 triangular magnetrons are specialty sources designed to optimize deposition uniformty onto a circle of substrates up to 8" Ø. |
|
|
| |
 |
AJA International has built numerous Turret Sources, multiple source heads on a single, rotating/indexing support tube. These sources allow deposition of multiple materials in the minimum amount of space. Two turrets in combination can deposit more than a dozen different materials with up to 36 different, co-deposited combinations. AJA A300-XP UHV and Stiletto HV source heads can be chosen depending on the requirement. |
|
|
 |
Featured above is the AJA NT-80 Nautilus Series Rotating Magnetron. This source features a configurable magnet array allowing the user to optimize target utilization, uniformity, or even "intentional non-uniformity". Philips, in the Netherlands, has also used this source with segmented, multi-material targets depositing onto spinning substrates to perform co-deposition tests from a single magnetron. |
|
|
|
|
|
|
|
|
| |
CUSTOM SUBSTRATE HOLDERS / FIXTURING
|
|
|
|
|
 |
Pictured above is a rotary substrate platen which can accommodate up to (9) 6" wafers, 6 (8") wafers or a large number of smaller substrates. This continuously rotating assembly can be configured with RF/DC bias, backside heating and a "quick exchange" substrate pallet. |
|
|
 |
This custom, flat planetary features instantly removable carriers for convenient, benchtop substrate mounting or cleaning. This assembly accommodates four 4" wafers or numerous smaller substrates. Larger versions holding up to four 300 mm wafers are also available. |
|
|
|
|
Custom pilot production batch coating systems require customized substrate holders and fixturing. AJA international has designed over 130 different types of substrate holders since 1991. These include rotating, indexing, linear and planetary motion, plus heating, cooling and RF/DC biasing. Different aspects of these proven designs can be combined to create a new, yet highly reliable custom substrate holder. Reliable substrate holder design is one of the most crucial parts of a custom batch coater and manufacturer experience can easily account for the difference between a maintenance intensive machine and the high throughput machine everyone desires.
|
|
|
|
|
|
| |
PHASE II-J COMPUTER CONTROL
|
|
|
|
|
|
|
|
AJA International’s Labview based Phase II-J computer control system is used on all ATC systems. This straightforward, user friendly control system utilizes a large, flat-screen laptop in a 19” rack drawer connected to a single 7” high x 19” wide rack mount hardware module. The back panel of the hardware module is populated with connectors to interface to all aspects of the sputtering system.
The Phase II-J control system allows the user to operate in either the “manual mode” or the “automated processing mode”. In the “ automated processing mode” the user designs process “layers” which are then compiled and saved as a “process”. The system allows 10 unique user entry points which are accessable only by password, limiting access to a user’s layers and preventing unexpected corruption of a user’s saved processes.
The standard Phase II-J control system will accommodate up to (5) DC power supplies, (4) RF power supplies, (1) 4-way DC switchbox, (1) 3-way RF switchbox, (4) process gases , closed loop automatic pressure control and substrate temperature control. Processes are aborted if plasma is not detected. Special “soak layers” can be easily incorporated into the process. Finally, data logging is standard with an adjustable refresh period. Process data can be downloaded to common spreadsheet programs.
|
|
|
|
|
|
| |
|
| |
|
Magnetron Sputter Sources w/
AJA custom options available
|
|
|
|
Substrate Holders
with heating/cooling/ rotation
|
|
|
|
Vacuum pumping
for
ATC Series
|
|
|
| |
|
Turbo-Pumped Cassette
Load
Lock for
3",4",6" & 8" substrates
|
|
|
|
Turbo-Pumped Load
Lock for single
substrates up to Ø 8"
|
|
|
|
| |
|
Power Distribution Module
|
|
|
|
|
| |
|
|
|
|
| |
|
