R & D MAGNETRON SPUTTERING SOURCES (HV AND UHV)

R&D Sputter Source

Stiletto Series HV Sources

Stiletto Series Circular Sources 1"- 4"
Stiletto Series Rectangular Sources
End mounted - for tube coating
Turrets and cluster flanges

A300 Series UHV Sources

A300-XP UHV Sources 1.5"- 6"
A310 1" UHV Sources
CTM Series Sources
Turrets and cluster flanges

A3CV Series UHV Sources

Convertible target modules
Specialty configurations

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PRODUCTION MAGNETRON SPUTTERING SOURCES (HV)

Production Sputter Source

STX & STXL Series Sources

STX Series Circular Sources 5"-12"
STXL Series Rectangular Sources 75mm x 300 mm to 150 mm x 1.0 m

Nautilus Rotating Magnet Sources

Open magnet architecture flexibility for tailored uniformity optimization

Cylindrical Target Sources

For 360° immersion coating

Triangular Target Sources

For 200 mm wafer batch coating

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