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AJA International Inc., 809 Country Way, N Scituate, MA  USA.
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Substrate Heaters


SUBSTRATE Holders - HEATERS


General Information
Since 1989 AJA International, Inc. has developed and manufactured a wide variety of UHV and HV substrate heaters and rapid annealing stations based on quartz lamp and SiC element technology. All designs are 100% oxygen compatible. High power lamps are economical and easily serviced.  Substrate rotation is required for sizes greater than 2". SiC element heaters can achieve higher temperatures and are capable of heating a larger substrate that is not rotating (for gradient film depositions).

AJA’s reliable substrate heaters can heat substrates from room temperature up to 800°C, 850°C or 1000°C depending on size and heater style.  Substrates up to 300 mm Ø can be heated in AJA tools. Optional, transferable substrate carriers are available which will allow the heaters to accommodate full size substrates or a number of small samples.

RF (or DC) biasing is optional for fixed and rotating models and permits both substrate pre-cleaning and simultaneous low energy ion bombardment during deposition to enhance adhesion, film density and film properties. Reactive gas injection rings / distributors and manual / motorized positioning are also available on most units. 

Finally, to provide a fully integrated, cost effective solution, AJA builds its own compact SHQ-15A/25A PID power supply / temperature controller units and MXMC (multi axis) and SXMC (single axis) motor controllers for substrate articulation.

SHQ-F - FIXED SUB. HEATERS/RAPID ANNEAL/O(2) FURNACE

For applications where the substrate is fixed in front of one or two quartz lamps, AJA builds 1” and 2” Ø HV and UHV heaters which reach 1000°C.  For 3” to 8” fixed substrates, substrate heaters, annealing stations and oxygen furnaces are available which can achieve 500°C to 900°C depending on requirements and design constraints.
Fixed Substrate Heater 1
Fixed Substrate Heater 2

SHQ-X - ROTATING SUBSTRATE HEATERS

Substrate rotation in front of AJA’s unique quartz lamp array optimizes both temperature and thin film deposition uniformity. SHQ-3X (up to 3” Ø substrates) and SHQ-4X (up to 4” Ø substrates) will achieve temperatures up to 850°C. SHQ-6X, SHQ-8X, SHQ-10X and SHQ-12X accommodate substrates from 6” to 12” Ø and can reach temperatures of up to 800°C.
Rotating Substrate Heater 1
Rotating Substrate Heater 2

SHQ-SIC - ROTATING/STATIC SUBSTRATE HEATERS

AJA’s silicon carbide substrate heaters are capable of achieving 1000°C in both the rotational and static mode.  AJA’s unique SiC element design is optimized for temperature uniformity with and without substrate rotation.  Additional options include manual or motorized z-motion, substrate gas ring, and RF/DC biasing.  Models available for 4”,6”, and 8” Ø substrates.
Rotating/Static Substrate Heater 1
Rotating/Static Substrate Heater 2

UNO SERIES - TILTING SUBSTRATE HEATERS

UNO Series substrate heaters allow up to +/- 200° rotation allowing either direct or angled deposition or etching.  The angled positioning can be manual or stepper motor controlled to within 0.1°. 
UNO Substrate Heater 1
The GLAD (Glancing Angle Deposition) substrate heater above utilizes manual positioning and has azimuthal substrate rotation.
UNO Substrate Heater 2
The special chemical duty UNO Series substrate heater above is compatible with reactive gases such as Chlorine and features a temperature range of 5°C to 200°C.

SHQ-15A/25A - PID POWER SUPPLY/TEMPerature CONTROLLERs

SHQ 15A/25A Controller
AJA manufactures two PID temperature controller/power supply units: the SHQ-15A (up to 2500 Watts) and the SHQ-25A (up to 5000 Watts). Both require 190 V - 240 V single phase power input and deliver +/- 1°C temperature stability and feature auto-tuning, external interlock and local/remote selector switch. Both models are half rack width x 3U.  19" rack adapters are available from stock for these compact units.  The controller also allows pre-programming (2) sets of PID values for seamless transition between low and high temperatures without re-tuning. 

MXMC / SXMC - SUBSTRATE HEATER MOTION CONTROLLERS

MXMC/SXMC Controller
The SXMC (single axis motor controller) is used in “rotation only” designs. The MXMC (multi axis motor controller) is used to rotate the substrate and to control motorized Z motion. Z motion is useful for adjusting working distances in deposition systems and in transfer and/or analysis.The MXMC adds a 4 position joystick (Up/Down/Jog CW/Jog CCW) which controls both the rotation and the Z motion motors. These controllers require a 190 V 240 V single phase power input and are designed to drive 12 VDC gear motors.



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AJA INTERNATIONAL, Inc.
809 Country Way North Scituate, MA 02066
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Tel: +1-781-545-7365      Fax: +1-781-545-4105
email: TOPGUN@AJAINT.COM
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