WELCOME TO AJA INTERNATIONAL, INC.

 

AJA International, Inc. (est. 1989) began as a supplier of innovative thin film, vacuum and microwave products. In 1991 the company introduced the first commercial, con-focal, sputter tool with a rotating substrate and magnetron heads which could be tilted without breaking vacuum. This innovation yielded extremely uniform depositions of single layers, multi-layers and alloys and has become the benchmark by which other R&D sputtering systems are measured - the ATC Series Sputtering System.

 

AJA International, Inc. has continued to develop many highly successful physical vapor deposition (PVD) tools including the compact ATC ORION Series Sputtering Systems, ATC-E and ATC ORION-E Evaporation Systems, the popular Stiletto Series HV sputter sources, SHQ Series substrate holders with heating, RF biasing, LN2 cooling, indexing, rotation and planetary motion, PHASE II Labview based, "plug and play" computer control systems, the STXL Series of large circular and rectangular magnetrons with modular magnet arrays, the Nautilus Series rotating “modular” magnetrons, automated combinatorial deposition systems, various ATC-B batch coating systems, a UHV downstream microwave oxygen plasma source, and a patented conical target magnetron which is ideal for three dimensional coatings and OLED applications.

 

AJA International, Inc. continues to discover innovative design solutions which are often copied but never equaled as the company truly remains THE CUTTING EDGE IN THIN FILM TECHNOLOGY.

 

 

 

HOT NEWS AT AJA INTERNATIONAL, INC. !!

 

ATC 1800-IM: ION MILLING TOOL

 

Ion Milling Tool

AJA International, Inc has developed and delivered a new ATC 1800-IM Ion Milling Tool for 200mm wafers and smaller substrates. Turbopumped load-locks are available for single wafer use or can be fitted with a 6 substrate cassette as shown for pilot scale production. The rotating substrate holder features wafer cooling which is accomplished by backside He or Ar gas. Computer control is standard and auto-loading is optional.

  • 100-200mm WAFERS
  • 320 A/min OXIDE ETCH
  • +/- 2% ETCH UNIFORMITY
  • PRICED BELOW $350K

 

 

ATC-SP-PLD: DUAL CHAMBER SPUTTER-PULSED LASER DEPOSITION

 

Full Berkeley SP PLD

 

AJA International, Inc. has developed and recently installed the new ATC-SP-PLD, a dual chamber, thin film deposition system combining Magnetron Sputtering and Pulsed Laser Deposition. The two process chambers are connected by a common load-lock positioned at the vertex of the system's right angle layout. In-line configurations, individual load-locks, and common docking stations with cassettes are also available. Each system is fitted with an 850°C substrate heater. The PLD side features in-situ RHEED,

 

a (6) material, target carousel with azimuthal rotation and programmable positioning/wobble to facilitate uniform target erosion. A shielded, laser beam safety tunnel with beam positioning is also included. The Magnetron Sputter side features up to (8) sources with in-situ tilt in a confocal geometry and up to (3) additional sources in a direct sputter configuration. These features allow for co-deposition, combinatorial depositions, precision ultra thin film depositions and high rate direct depositions.

 

 

ATC 2200-HY: HYBRID THIN FILM DEPOSITION TOOL

 

Hybrid Thin Film Deposition Tool

AJA International, Inc. has delivered numerous of ATC 2200-HY UHV, Hybrid, Thin Film Deposition Tools. The most common version shown at the left features (6) UHV magnetron sputter sources, (1) 5 pocket linear UHV e-beam source, load-lock, computer control, cryo-pump, dry mechanical pump and 850C substrate heating or LN2 cooling. Typical deposition techniques include:

  • UHV Magnetron Sputtering
  • UHV Multipocket E-Beam
  • UHV Thermal
  • UHV Ion Beam
  • UHV PLD

 

 

ATC-SP-E/N-D: AUTO-LOADED, DEEP UHV, DUAL SYSTEM for SPUTTERING, NITRIDIZATION and ELLIPSOMETRY

 

RDEC 3

 

AJA International, Inc. has delivered a new, customized, multi-chamber deposition system, the ATC-SP-E/N-D, a dual process chamber tool with automated wafer transfer combining load-lock, Magnetron Sputtering and Ellipsometry/Nitridization chambers. The AJA Phase II J computer control allows one button, pre-programmed processing/measurement from load to unload. Six position load-lock cassettes and right angle configuration are also available. Both process chambers are designed to achieve

 

10-10 Torr base vacuum with removable bakeout jackets. The sputtering system accommodates 3" substrates and features 1000°c heating, rotation, RF biasing and (4) AJA Super A315 (1.5) UHV sputtering sources with in-situ tilting in a con-focal arrangement, and (1) 4 UHV sputtering source located on-axis for direct, high rate deposition onto the substrate. The Nitridization chamber is equipped with a water-cooled, RF biased substrate holder, ICP RF plasma source, and a J.A Woolam ellipsometer.

 

 
PRODUCT OVERVIEW

 

SPUTTER SOURCES / SPUTTERING SYSTEMS / PVD EQUIPMENT:

 

AJA manufactures ATC SERIES and ATC ORION SERIES magnetron sputtering systems; PVDX e-beam / thermal / sputter multi-technique physical vapor deposition (PVD) systems; A300-XP, A3CV, Stiletto and Nautilus magnetron sputtering sources; peripheral equipment for substrate heating, cooling, RF biasing and motion. Sputtering systems are configured primarily for R&D and pilot production with either UHV or HV construction. AJA International, Inc. also manufactures a wide range of magnetron sputtering sources for R&D and production applications ranging in target size from 1” to 40” and up to 12” ID cylindrical. Nautilus Series rotating magnetron sputtering sources are designed for production coating tools. AJA also offers sputtering targets, PVD materials, as well as RF / DC power supplies and switchboxes for sputter deposition.

 

 

MICROWAVE:

 

AJA International, Inc. is the exclusive US distributor for Sairem microwave generators, power supplies, tuners, circulators, dummy loads, waveguide components, power splitters and microwave detectors. With extensive experience, the AJA / Sairem combination will find a cost effective solution to your microwave application requirement.

 

 
COMPANY PHILOSOPHY & RESPONSIBILITY

 

Company Headquarters, North Scituate, MA, USA
Located one mile from the Atlantic Coast

 

It has always been the primary philosophy of AJA to expand conservatively, manufacturing and representing products of exceptional value, while relying on customer satisfaction and technical excellence as our primary promotional vehicles. The company chooses its projects carefully in order to maintain its reputation and financial stability.

Our first responsibility will always be to our customers, since without our customers we are nothing. The interaction between AJA personnel and their customers must be a positive, professional and efficient experience. Anyone calling AJA International, Inc. will always speak to a person and will never be routed through the impersonal frustration of an automated answering system. At AJA, we consider your time as valuable as our own.

To all of our customers, thank you for your continued support.

William Hale
President