Sputter Beam Epitaxy
SBE-6 Series Sputter Beam Epitaxy (SBE) Deposition System
Overview
The SBE-6 Series Sputter Beam Epitaxy (SBE) Deposition System was developed in collaboration with Professor Adam Hauser at the University of Alabama. This advanced platform integrates years of refinement in deposition geometry—specifically, the optimization of incident angles and target-to-substrate distances—within AJA International’s proven engineering framework and high-performance components recognized globally for their reliability.
In contrast to conventional "off-axis" sputtering configurations, the SBE-6 Series enables the co-deposition or sequential deposition of up to six distinct materials, with a design that ensures exceptional material isolation to mitigate cross-contamination. Furthermore, the precise control of angular alignment and working distances supports deposition quality that rivals molecular beam epitaxy (MBE) systems, positioning the SBE-6 as a leading-edge solution in thin-film fabrication.
Key Features of the SBE-6 Series Sputter Beam Epitaxy System
Magnetron Sputtering Sources:
The SBE-6 system accommodates up to six 1.5” or 2” magnetron sputtering sources, each equipped with individual isolation shielding and shutters to minimize cross-contamination and enable precise control of deposition parameters.
Substrate Holder:
The substrate holder is highly configurable, supporting sample sizes ranging from small coupons to full wafers of 3", 4", 6", or 8" diameter. Available functionalities include high-temperature substrate heating (up to 800–1000 °C), cryogenic or water-based cooling (LN₂ or H₂O), azimuthal rotation for uniform film growth, motorized Z-axis motion, and RF/DC substrate biasing for advanced process control.
Power Supply Options:
AJA International offers a comprehensive selection of power supply configurations, including DC, RF, pulsed DC, and high-power impulse magnetron sputtering (HiPIMS). For epitaxial applications, traditional DC and RF sources are generally preferred for their stability and compatibility with a wide range of materials.
Ultra-High Vacuum (UHV) Design:
The SBE-6 system is engineered to achieve base pressures ranging from the low 10⁻⁷ Torr to the low 10⁻¹⁰ Torr regime. Systems can be constructed using all-metal seal vacuum chambers, and in-house manufactured bakeout jackets are available for thorough vacuum conditioning and system degassing.
Process Gas Delivery:
The system supports up to four mass flow controllers (MFCs) for precise regulation of process gases. Typical gases used in epitaxial deposition include Ar, O₂, and N₂, allowing for a wide range of reactive and inert sputtering processes.
Quartz Crystal Monitor:
A quartz crystal microbalance (QCM) enables real-time thickness monitoring and calibration. The system supports both manual and fully automated operation modes for precise film thickness control.
Load-Lock System:
AJA provides multiple load-lock configurations to meet varying throughput requirements, including manual and automated sample transfer mechanisms. For high-throughput applications, cassette-based systems can accommodate 2 to 10 carriers. Optional modules for sample pre-cleaning, degassing, oxidation, or in-situ analytical diagnostics can be integrated as needed.
In-Situ Analytical Capabilities:
The SBE-6 platform is compatible with a wide range of in-situ characterization tools, including reflection high-energy electron diffraction (RHEED), ellipsometry, optical emission spectroscopy (OES), pyrometry, and residual gas analysis (RGA), enabling real-time monitoring of growth conditions and film properties.
Multi-Chamber Integration:
The SBE-6 Series can be configured for multi-chamber operation, supporting direct vacuum-compatible connections with additional process modules. These may include co-focal sputtering systems, electron-beam deposition sources, or third-party equipment. Designed with future expansion in mind, the system facilitates in-situ sample transfer between chambers to preserve vacuum integrity and minimize exposure.
Performance
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The SBE-6 Series Sputter Beam Epitaxy (SBE) Deposition System represents a unique solution available from AJA International. The SBE-6 combines AJA’s trusted engineering with breakthrough deposition geometry to deliver MBE-like film quality using advanced magnetron sputtering. Its unmatched material isolation, configurability, and ultra-high vacuum performance make it the ideal platform for high-precision thin-film research and production.
To learn more about how the SBE-6 can elevate your deposition capabilities, contact our sales team today.