OVERVIEW
Sputtering Systems
Configuration Overview
AJA offers HV and UHV magnetron sputtering systems for research scale physical vapor deposition ranging from compact (Orion Series) to complex (ATC Series) to systems for epitaxial film growth by sputtering (SBE Series) plus small batch coaters (Batch Series). These sputtering systems can be configured in either con-focal, normal incidence, off-axis, glancing angle, or combination of target to substrate orientations. Substrate holder features include radiant heating (1000°C), azimuthal rotation, RF/DC biasing, z-motion, cooling (H2O or LN2), tilting, or planetary motion.
Orion Series
Compact Systems
Price range: $125,000 - $350,000
14" chamber Ø
1”, 1.5", 2" and 3" sputter sources
Substrate holders up to 6" Ø
Load-lock and cassette options
Auto-loading
Computer control
ATC Series
Flagship Systems
Price Range: $175,000 - $950,000+
18" to 34" chamber Ø
1" to 8" diameter sputter sources
In-situ tilt source option
Substrate holders to 12" Ø
Load-lock and cassette options
Auto-loading & Computer Control
Batch Series
Batch Coating Systems
Price range: $150,000 - $850,000+
Cylindrical or box style chambers
Load-lock & cassette options
Circular, triangular or linear sputtering sources
Integrated hoist or hinged door
Single, multi-layer or co-deposition
Substrate heating, H2O cooling, RF biasing / Ion source cleaning
SBE Series
Sputter Beam Epitaxy Systems
Price range: $400,000 - $650,000+
14" or 18" chamber Ø
1.5" or 2" diameter sputter sources
In-situ tilt source option
Substrate holders to 4" Ø
Load-lock and cassette options
Auto-loading & Computer Control