WELCOME TO AJA INTERNATIONAL INC.

AJA is a manufacturer of thin film deposition systems including magnetron sputtering, e-beam evaporation, thermal evaporation, and ion milling systems.  Founded in Scituate,  MA, USA in 1989 by William Hale, MBA, BS Physics, the company was established as a supplier of innovative physical vapor deposition (PVD) products.  With many systems and magnetron sputter sources shipped worldwide,  AJA International, Inc. continues to discover innovative design solutions which are often copied but never equaled. The company truly remains THE CUTTING EDGE IN THIN FILM TECHNOLOGY.

WHAT'S NEW AT AJA 

ATC-MC-HY Multi-Chamber Hybrid Deposition Tool

ATC -MC-HY Multi-Chamber Hybrid Deposition Tool with UHV Transfer Tube & Glovebox Interface
The ATC-HY Multi-Chamber Hybrid Deposition Tool combines two Hybrid Process Chambers, each featuring e-beam and thermal evaporation, confocal magnetron sputtering, ion beam etching with a 360 degree tilt, and a water-cooled substrate holder.  In addition, a third process chamber features post anneal, oxygenation and ashing capability.  All are connected via a UHV magnetic transfer tube with sectional isolation, integral load-lock and glovebox compatibility. 

ATC-3036-R2R Rolling Coating System
The ATC-3036-R2R Roll Coating System
The Rolling Coating System is designed to accommodate PET, PEN, Kapton rolls up to 6”W x 700’ L.  Equipped with (4) rectangular magnetron sources optimized for high rate metals, magnetic materials, dielectrics, and precious metals with individual crystal monitors for rate control, and in-situ masking system for web patterning. The advanced web handling system includes bi-directional operation with dual sided glow discharge for roll outgassing, water-cooled rollers to minimize roll temperature, and laser guiding system to prevent the roll from telescoping on the take-up and feed rollers.  

PRODUCT OVERVIEW

AJA International, Inc. has developed many highly successful R&D and pilot production scale tools and components for physical vapor deposition (PVD) and ion milling:
  • Ion Milling Systems - physical etching tools in various sizes with substrate cooling and SIMS end point detection. RF and DC Ion sources available up to 22 cm diameter.  Convenient slide rail access for larger sources.
  • Multi-Chamber Systems - with deposition, milling, evaporation, annealing, PLD, load-lock and analysis in connected chambers.
  • Hybrid Systems - load-locked single chambers with some combination of deposition, milling, evaporation, annealing, PLD and analysis.
  • RF Generators and Matching Networks - 100, 300, 600, 1000 and 2000 Watt 13.56 MHz RF generators for sputtering and RF biasing.
  • DC Generators - 750 W and 1500 W continuous DC generators with integral 4 way switchboxes.
  • Pulsed DC Generators - 1000, 1500 and 5000 Watt asymmetric bipolar pulsed DC generators.
  • HiPIMS - high power, pulsed DC generators to ionize the sputtered material for acceleration, deceleration and flux orientation.
  • Sputtering Targets and Evaporation Materials -Circular and rectangular targets in all sizes.  Common, custom and precious materials, with or without backing plates and magnetic keepers available. Evaporation Materials in pellet and wire form.  Common, custom and precious materials for e-beam and thermal evaporation available.