Sputtering Targets

Sputtering is the most common physical vapor deposition technique, offering ease of use across a wide variety of elemental and compound materials, stable deposition conditions, and long life of the consumable target.

AJA International offers an extensive selection of sputtering targets, from elemental metals of highest purity, to alloys, to dielectrics and compounds. There are materials suitable for a wide range of applications.

Targets are sized from 1” – 6” in diameter. Target thickness ranges from 1 mm (magnetic materials) to 0.25”. Insulating targets are provided bonded to copper backing plates for mechanical support and heat dissipation.

Shop for materials from the alphabetical menu above. A price request link for special order materials is available below the materials list.